UV LED Photolithography
As it stands, most WEE applications use broadband radiation in the spectral range
between 350 and 450 nm. The most common solutions are conventional fiber-coupled
mercury discharge lamps with a rated power of 150 to 500 W. Finding more economical
and reliable alternatives to these system setups was difficult because WEE requires
broadband exposure. Enter Primelite’s Advanced Light Engines ALE/1 and ALE/3, which
are designed to deliver their optical output via flexible LED Light Guides: Both systems
cover the spectral range of conventional mercury discharge lamps and easily outperform
the typical intensities required in wafer edge exposure processes.
본문
Wafer Edge Exposure (WEE) is a common step in high-volume semiconductor manufacturing. WEE processes a round edge and the ID region of a wafer after exposure using lithography tools such as wafer steppers. Fabs add this high-intensity exposure to their production line to increase the yield of semiconductor devices from the wafer. WEE allows for an absolute minimum exposure width at the wafer edge to minimize yield loss (positive resist) or to protect the edge from contamination during further handling (negative resist). WEE equipment can be connected to a semiconductor wafer track as a stand-alone unit or integrated directly into stepper equipment.
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PGL-06-00079-H-Advanced-Light-Engine-ONE-Handout-EN.pdf (1.1M)
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PGL-06-00094-H-Advanced-Light-Engine-THREE-Handout-EN.pdf (1,004.4K)
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