UV LED Photolithography
Manual, semi-automated, and fully-automated mask aligners are found everywhere
from low-volume R&D setups to high-volume mass production lines Primelite’s UV-LED
Lithography Exposure Systems (ALE/1, ALE/1C, and ALE/2) fully comply with the
requirements of any manufacturing scenario and have been integrated into a wide range
of mask aligners to replace small (200 W, 350 W, 500 W) and medium-sized
(750 W, 1,000 W, 1,500 W) mercury arc lamps in broadband applications.
In i-line-only processes, our UV-LED exposure systems match the performance of
conventional discharge lamps rated for up to 5,000 W.
본문
Mask alignment systems feature prominently in back-end lithography for MEMS, compound semiconductors, power devices, and microfluidics. With good reason: Increasingly
integrated microstructures are so much easier to produce with advanced packaging technologies such as wafer-level chip-scale packaging (WLCSP), fan-out wafer-level packaging(FOWLP), flip-chip packaging, 3D-IC / through silicon via (TSV), bumping, and 2.5D interposer.
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